Effect of Ga Incorporation and Film Thickness on the Optical Properties of as-Deposited Amorphous GaxSel-x Thin Films
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Publication Date
2014Author
Austine A Mulama, Julius M Mwabora, Andrew O Oduor, Cosmas M Muiva, Chrispinus M Walloga
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Flash evaporated amorphous GaxSe1-x (x = 0, 1, 2, 3, and 4 atomic %) on glass substrates have been
investigated within a 500nm-1500nm spectral range. Film thicknesses explored were ; 200±10nm, 265±10nm,
330±10nm, and 400±10nm. The effect of film thickness and gallium content on the as-deposited thin films has
been established. As the gallium content increases, both the optical transmittance and band gap energy
decrease. Increase in film thickness led to a decrease in optical transmittance and an increase in the band gap
energy. The other optical parameters like the absorption coefficient, extinction coefficient, refractive index, real
part and imaginary part of dielectric constant increase with increase in gallium content and film thickness.